Method, program product and apparatus for obtaining...

Data processing: structural design – modeling – simulation – and em – Simulating nonelectrical device or system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000

Reexamination Certificate

active

07818151

ABSTRACT:
A process of obtaining short-range flare model parameters representing a short-range flare which degrades a contrast of an image generated by a lithography tool, is disclosed. Short-range flare is measured from the image to obtain measured short-range flare data. A simulation is performed based on short-range flare model parameters to obtain simulated short-range flare data. The simulated short-range flare data is compared with the measured short range flare data. It is determined whether the short-range flare model parameters used in the simulation is appropriate based on the comparison result. The short-range flare model parameters is optimized according to the measured short-range data and the simulated short-range flare data if the short-range flare model parameters used for the simulation is not appropriate.

REFERENCES:
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6470489 (2002-10-01), Chang et al.
patent: 7199863 (2007-04-01), Bruls et al.
patent: 7422829 (2008-09-01), Babcock et al.
patent: 7470504 (2008-12-01), Lai et al.
patent: 2004/0017574 (2004-01-01), Vuong et al.
patent: 2005/0102648 (2005-05-01), Hsu et al.
patent: 2006/0132749 (2006-06-01), Bruls et al.
Chris A. Mack, “Measuring and Modeling Flare in Optical Lithography” Proceedings of SPIE, 2003, pp. 151-161.
Stearns et al. “Nonspecular x-ray scattering in a multilayer-coated imaging system”, Journal of Applied Physics, vol. 84, No. 12, pp. 1003-1028, Jul. 15, 1998.
Stover, Harry L. “Optical Microlithography VI”, Proceedings of SPIE—The International Society for Optical Engineering, pp. 6-20, Mar. 4-5, 1987.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method, program product and apparatus for obtaining... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method, program product and apparatus for obtaining..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method, program product and apparatus for obtaining... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4185775

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.