Silicon-containing film-forming composition,...

Details Silicon-containing film-forming composition,... Silicon-containing film-forming composition,...

2007-06-06

2010-12-21

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S272100, C430S311000, C430S313000, C430S317000, C430S323000, C430S325000, C430S326000

Reexamination Certificate

active

07855043

ABSTRACT:
A silicon-containing film is formed from a heat curable composition comprising (A-1) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of an acid catalyst and removing the acid catalyst, (A-2) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound in the presence of a basic catalyst and removing the basic catalyst, (B) a hydroxide or organic acid salt of lithium, sodium, potassium, rubidium or cesium, or a sulfonium, iodonium or ammonium compound, (C) an organic acid, and (D) an organic solvent. The silicon-containing film allows an overlying photoresist film to be patterned effectively.

REFERENCES:
patent: 5385804 (1995-01-01), Premlatha et al.
patent: 5632910 (1997-05-01), Nagayama et al.
patent: 6025117 (2000-02-01), Nakano et al.
patent: 6071673 (2000-06-01), Iguchi et al.
patent: 6280898 (2001-08-01), Hasegawa et al.
patent: 6329125 (2001-12-01), Takechi et al.
patent: 6503692 (2003-01-01), Angelopoulos et al.
patent: 6703183 (2004-03-01), Nishi et al.
patent: 7186495 (2007-03-01), Maeda et al.
patent: 7638268 (2009-12-01), Ogihara et al.
patent: 2004/0247900 (2004-12-01), Ogihara et al.
patent: 2004/0253461 (2004-12-01), Ogihara et al.
patent: 2005/0016499 (2005-01-01), Noda et al.
patent: 2005/0181299 (2005-08-01), Trefonas et al.
patent: 2006/0019195 (2006-01-01), Hatakeyama et al.
patent: 2007/0117411 (2007-05-01), Ogihara et al.
patent: 1 788 433 (2007-05-01), None
patent: 1 788 437 (2007-05-01), None
patent: 5-291208 (1993-11-01), None
patent: 6-95385 (1994-04-01), None
patent: 7-181688 (1995-07-01), None
patent: 7-183194 (1995-07-01), None
patent: 8-12626 (1996-01-01), None
patent: 9-73173 (1997-03-01), None
patent: 11-60735 (1999-03-01), None
patent: 2000-159758 (2000-06-01), None
patent: 2003-84438 (2003-03-01), None
patent: 2004-153125 (2004-05-01), None
patent: 2004-157469 (2004-06-01), None
patent: 2004-191386 (2004-07-01), None
patent: 2004-349572 (2004-12-01), None
patent: 2005-15779 (2005-01-01), None
patent: 2005-128509 (2005-05-01), None
patent: 2005-146252 (2005-06-01), None
patent: 2005-520354 (2005-07-01), None
patent: WO-00/01684 (2000-01-01), None
Sugita et al. “Spin-on-Glass (SOG) for the Trilayer Imaging Process” J. Appl. Polym. Sci., vol. 88, 636-640 (2003).
C. J. Brinker and G. W. Scherer, “Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing,” Academic Press, San Diego (1990).
Ito et al., “Synthesis and Preliminary Evaluation of Substituted Poly(Norbornene Sulfones) for 193 NM Lithography.” Polym. Mater. Sci. Eng., 1997, 77, pp. 449.

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