Resist top coat composition and patterning process

Details Resist top coat composition and patterning process Resist top coat composition and patterning process

2007-06-11

2010-02-23

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S273100, C430S325000, C430S326000, C430S905000, C430S907000

Reexamination Certificate

active

07666572

ABSTRACT:
There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.

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Machine-assisted English translation of JP 2003-301006 as provided by JPO.
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