Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2009-03-11

2010-10-26

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230ER, C156S345340, C156S345410, C156S345430

Reexamination Certificate

active

07819082

ABSTRACT:
In a microwave plasma processing apparatus, a metal made lattice-like shower plate111is provided between a dielectric material shower plate103, and a plasma excitation gas mainly an inert gas and a process gas are discharged form different locations. High energy ions can be incident on a surface of the substrate114by grounding the lattice-like shower plate. The thickness of each of the dielectric material separation wall102and the dielectric material at a microwave introducing part is optimized so as to maximize the plasma excitation efficiency, and, at the same time, the distance between the slot antenna110and the dielectric material separation wall102and a thickness of the dielectric material shower plate103are optimized so as to be capable of supplying a microwave having a large power.

REFERENCES:
patent: 4985109 (1991-01-01), Otsubo et al.
patent: 5010842 (1991-04-01), Oda et al.
patent: 5134965 (1992-08-01), Tokuda et al.
patent: 5304250 (1994-04-01), Sameshima et al.
patent: 5451290 (1995-09-01), Salfelder
patent: 5525159 (1996-06-01), Hama et al.
patent: 5556475 (1996-09-01), Besen et al.
patent: 5567267 (1996-10-01), Kazama et al.
patent: 5698036 (1997-12-01), Ishii et al.
patent: 5803975 (1998-09-01), Suzuki
patent: 5834730 (1998-11-01), Suzuki et al.
patent: 5874706 (1999-02-01), Ishii et al.
patent: 5891252 (1999-04-01), Yokogawa et al.
patent: 5955382 (1999-09-01), Yamauchi et al.
patent: 6013155 (2000-01-01), McMillin et al.
patent: 6059922 (2000-05-01), Yamazaki et al.
patent: 6189485 (2001-02-01), Matsuda et al.
patent: 6217703 (2001-04-01), Kitagawa
patent: 6322662 (2001-11-01), Ishii et al.
patent: 6357385 (2002-03-01), Ohmi et al.
patent: 6399520 (2002-06-01), Kawakami et al.
patent: 6446573 (2002-09-01), Hirayama et al.
patent: 6514347 (2003-02-01), Denpoh
patent: 6518195 (2003-02-01), Collins et al.
patent: 6545420 (2003-04-01), Collins et al.
patent: 6607633 (2003-08-01), Noguchi
patent: 6669825 (2003-12-01), Ohmi et al.
patent: 6830652 (2004-12-01), Ohmi et al.
patent: 6975018 (2005-12-01), Ohmi et al.
patent: 6998355 (2006-02-01), Ohmi et al.
patent: 7097735 (2006-08-01), Ohmi et al.
patent: 7312415 (2007-12-01), Ohmi et al.
patent: 7446052 (2008-11-01), Sugawara et al.
patent: 7520245 (2009-04-01), Ohmi et al.
patent: 7537672 (2009-05-01), Koshiishi et al.
patent: 7662236 (2010-02-01), Sugawara et al.
patent: 2002/0164883 (2002-11-01), Ohmi et al.
patent: 2003/0178144 (2003-09-01), Ohmi et al.
patent: 2005/0205015 (2005-09-01), Sasaki et al.
patent: 2006/0251828 (2006-11-01), Kobayashi et al.
patent: 2007/0144671 (2007-06-01), Ohmi et al.
patent: 2007/0259131 (2007-11-01), Kobayashi et al.
patent: 2008/0138996 (2008-06-01), Nishizuka
patent: 2008/0311313 (2008-12-01), Kobayashi et al.
patent: 2009/0023296 (2009-01-01), Nishizuka
patent: 2009/0029066 (2009-01-01), Matsuoka et al.
patent: 2009/0029564 (2009-01-01), Yamashita et al.
patent: 2009/0041568 (2009-02-01), Muraoka et al.
patent: 2009/0133835 (2009-05-01), Nishimoto et al.
patent: 2009/0183677 (2009-07-01), Tian et al.
patent: 2009/0205782 (2009-08-01), Ohmi et al.
patent: 2009/0291563 (2009-11-01), Ishibashi
patent: 2009/0311869 (2009-12-01), Okesaku et al.
patent: 2009/0314629 (2009-12-01), Nishimoto
patent: 2009/0317566 (2009-12-01), Nishimoto
patent: 2009/0320756 (2009-12-01), Tanaka
patent: 2010/0025821 (2010-02-01), Ohmi et al.
patent: 2010/0178775 (2010-07-01), Okesaku et al.
patent: 2 226 049 (1990-06-01), None
patent: 01-120810 (1989-05-01), None
patent: 02-52328 (1990-04-01), None
patent: 02-237020 (1990-09-01), None
patent: 03-120382 (1991-05-01), None
patent: 06-0611153 (1994-03-01), None
patent: 06-112141 (1994-04-01), None
patent: 06-260434 (1994-09-01), None
patent: 07-312348 (1995-11-01), None
patent: 08-111297 (1996-04-01), None
patent: 09-63793 (1997-03-01), None
patent: 09-115882 (1997-05-01), None
patent: 10-64881 (1998-03-01), None
patent: 10-150026 (1998-06-01), None
patent: 11-302824 (1999-11-01), None
patent: 2000-195800 (2000-07-01), None
patent: WO 97/48834 (1997-12-01), None
patent: WO 98/33362 (1998-07-01), None
patent: WO 99/00532 (1999-01-01), None

Affiliated with

Also associated with

Rating

Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4179344