High performance metal gate polygate 8 transistor SRAM cell...

Static information storage and retrieval – Systems using particular element – Flip-flop

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S063000, C365S230050, C257S202000, C257S204000, C257S903000

Reexamination Certificate

active

07826251

ABSTRACT:
A static random access memory cell includes a metal hi-k layer; a poly-SiON gate stack over the metal hi-k layer; a plurality of inverters disposed within the poly-SiON gate stack; and a plurality of field effect transistors placed in the metal hi-k layer.

REFERENCES:
patent: 6140688 (2000-10-01), Gardner
patent: 6303418 (2001-10-01), Cha
patent: 6477080 (2002-11-01), Noble
patent: 6777761 (2004-08-01), Clevenger
patent: 7106620 (2006-09-01), Chang et al.
patent: 7233032 (2007-06-01), Liaw
patent: 7376002 (2008-05-01), Nii
patent: 7440356 (2008-10-01), Venkatraman et al.
patent: 2005/0233530 (2005-10-01), Barnak
patent: 2007/0242513 (2007-10-01), Chang

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High performance metal gate polygate 8 transistor SRAM cell... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High performance metal gate polygate 8 transistor SRAM cell..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High performance metal gate polygate 8 transistor SRAM cell... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4175749

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.