Method of producing micromechanical sensors for the AFM/STM prof

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156647, 156651, 156653, 156657, 1566591, 1566611, 156662, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

051164620

ABSTRACT:
A micromechanical sensor is described for the AFM/STM profilometry, incorporating a cantilever beam with at least one tip at its end and a mounting block at the opposite end. A method is described incorporating the steps of coating a wafer substrate with an insulating layer, forming a mask in the insulating layer, etching a trench in the wafer substrate, removing the insulating layer, coating the desired cantilever beam and tip material, respectively, etching the cantilever beam and tip material, and removing at least a portion of the supporting wafer material from the bottom side. The invention overcomes the problem of forming a micromechanical sensor having a cantilever beam, a tip with a predetermined shape and a mounting block.

REFERENCES:
patent: 4312117 (1982-01-01), Robillard et al.
patent: 4916002 (1990-04-01), Carver
patent: 4943719 (1990-07-01), Akamine et al.
patent: 4968585 (1990-11-01), Albrecht et al.

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