Manufacturing method of semiconductor device and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S458000, C257SE21008

Reexamination Certificate

active

07829396

ABSTRACT:
Instead of forming a semiconductor film by bonding a bond substrate (semiconductor substrate) to a base substrate (supporting substrate) and then separating or cleaving the bond substrate, a bond substrate is separated or cleaved at a plurality of positions to form a plurality of first semiconductor films (mother islands), and then the plurality of first semiconductor films are bonded to a base substrate. Subsequently, the plurality of first semiconductor films each are partially etched, whereby one or more second semiconductor films (islands) are formed using one of the first semiconductor films and a semiconductor element is manufactured using the second semiconductor films. The plurality of first semiconductor films are bonded to the base substrate based on a layout of the second semiconductor films so as to cover at least a region in which the second semiconductor films of the semiconductor element are to be formed.

REFERENCES:
patent: 6380046 (2002-04-01), Yamazaki
patent: 7052974 (2006-05-01), Mitani et al.
patent: 7199024 (2007-04-01), Yamazaki
patent: 7298009 (2007-11-01), Yan et al.
patent: 7312487 (2007-12-01), Alam et al.
patent: 7332384 (2008-02-01), Buchholtz et al.
patent: 2009/0047771 (2009-02-01), Yamazaki et al.
patent: 05-090117 (1993-04-01), None
patent: 07-297377 (1995-11-01), None
patent: 2000-012864 (2000-01-01), None
patent: 2005-039171 (2005-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing method of semiconductor device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing method of semiconductor device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method of semiconductor device and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4166310

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.