Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-03-28
2010-10-05
Mehta, Bhavesh M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S141000, C382S144000, C382S145000, C382S209000, C382S294000
Reexamination Certificate
active
07809181
ABSTRACT:
A pattern inspection apparatus includes a first unit configured to acquire an optical image of pattern, a second unit configured to generate a reference image to be compared, a third unit configured to calculate elements of a normal matrix for a least-squares method for calculating a displacement amount displaced from a preliminary alignment position, a forth unit configured to estimate a type of the reference image pattern, by using some of the elements of the normal matrix, a fifth unit configured to calculate the displacement amount based on the least-squares method, by using a normal matrix obtained by deleting predetermined elements depending upon the type of the pattern, a sixth unit configured to correct an alignment position between the optical image and the reference image to a position displaced by the displacement amount, and a seventh unit configured to compare the optical image and the reference image.
REFERENCES:
patent: 4805123 (1989-02-01), Specht et al.
patent: 5563702 (1996-10-01), Emery et al.
patent: 5742067 (1998-04-01), Imai
patent: 6396943 (2002-05-01), Yamashita
patent: 6481003 (2002-11-01), Maeda
patent: 6876946 (2005-04-01), Yasuda et al.
patent: 7330606 (2008-02-01), Yakhini et al.
patent: 7508515 (2009-03-01), Hanina et al.
patent: 2007/0053582 (2007-03-01), Yamashita
patent: 63-88682 (1988-04-01), None
patent: 3-278057 (1991-12-01), None
patent: 5-281154 (1993-10-01), None
patent: 6-307826 (1994-11-01), None
patent: 8-64511 (1996-03-01), None
patent: 8-76359 (1996-03-01), None
patent: 8-77357 (1996-03-01), None
patent: 8-304997 (1996-11-01), None
patent: 10-96613 (1998-04-01), None
patent: 10-318950 (1998-12-01), None
patent: 11-132959 (1999-05-01), None
patent: 11-153550 (1999-06-01), None
patent: 2000-348177 (2000-12-01), None
patent: 2001-141677 (2001-05-01), None
patent: 2002-14062 (2002-01-01), None
patent: 2004-317427 (2004-11-01), None
M. Takagi, et al., Handbook on Image Analysis, University of Tokyo Press, Jan. 17, 1991., 2 pages (with Partial English Translation).
U.S. Appl. No. 11/678,748, filed Feb. 26, 2007, Yamashita.
U.S. Appl. No. 11/692,352, filed Mar. 28, 2007, Yamashita.
M. Takagi, et al., “Handbook on Image Analysis”; University of Tokyo Press; Jan. 17, 1991; pp. 442-443 (with Partial English Translation).
Advanced Mask Inspection Technology Inc.
Mehta Bhavesh M
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Shah Utpal
LandOfFree
Pattern inspection apparatus, image alignment method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern inspection apparatus, image alignment method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection apparatus, image alignment method,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4164925