Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2007-12-20
2010-02-02
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S317000, C430S323000, C430S271100, C430S272100, C528S205000, C528S212000, C528S219000, C525S481000, C525S494000, C525S491000, C525S492000
Reexamination Certificate
active
07655386
ABSTRACT:
An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C:In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1is methylene or includes a non-fluorene-containing aryl linking group.
REFERENCES:
patent: 2006/0251990 (2006-11-01), Uh et al.
patent: 2007/0287821 (2007-12-01), Doetz et al.
patent: 2008/0255315 (2008-10-01), Ogura et al.
patent: WO-2006/025429 (2006-03-01), None
Hyung Kyung Hee
Kim Jong Seob
Kim Min Soo
Lee Jin Kuk
Oh Chang Il
Cheil Industries Inc.
Hamilton Cynthia
Lee & Morse P.C.
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