Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-10-26
2010-10-19
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S273100, C430S311000, C430S313000, C430S317000, C430S331000
Reexamination Certificate
active
07816068
ABSTRACT:
A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide planarizing underlayers having outstanding optical, mechanical and etch selectivity properties. The present invention also encompasses lithographic structures containing the underlayers prepared from the compositions of the present invention, methods of making such lithographic structures, and methods of using such lithographic structures to pattern underlying material layers on a substrate.
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Machine translation of JP 2002-014474 (no date).
U.S. Office Actions dated Nov. 15, 2007 and Mar. 30, 2010.
Huang Wu-Song S.
Temple Karen
Varanasi Pushkara R.
International Business Machines - Corporation
MacKinnon, Esq. Ian D.
Scully , Scott, Murphy & Presser, P.C.
Walke Amanda C.
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