Curvature-based edge bump quantification

Data processing: measuring – calibrating – or testing – Measurement system – Dimensional determination

Reexamination Certificate

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Details

C073S865800, C356S237500, C356S600000, C382S145000, C382S149000, C702S081000, C702S187000, C702S189000

Reexamination Certificate

active

07853429

ABSTRACT:
Evaluating irregularities in surfaces of objects such as semiconductor wafers using a thickness profile of a surface section and analyzing the profile to obtain information of an irregularity start position, magnitude, and span along with surface slope and height information.

REFERENCES:
patent: 2798966 (1957-07-01), Summerhayes, Jr.
patent: 3136069 (1964-06-01), Reason
patent: 3615143 (1971-10-01), Reason et al.
patent: 3667846 (1972-06-01), Nater et al.
patent: 4109508 (1978-08-01), Fukuyama
patent: 5135303 (1992-08-01), Uto et al.
patent: 5463464 (1995-10-01), Ladewski
patent: 5465153 (1995-11-01), Ladewski
patent: 5973777 (1999-10-01), Nomoto et al.
patent: 7324917 (2008-01-01), Koliopoulos et al.
patent: 2003/0023402 (2003-01-01), Kobayashi et al.
patent: 2006/0004542 (2006-01-01), Koliopoulos et al.
patent: 2008/0199978 (2008-08-01), Fu et al.
patent: WO 2006/014317 (2006-02-01), None
SEMI M68-1108, 2007, 2008 (updated standard for Document No. 4209 of Semiconductor Equipment and Materials International, 3081 Zanker Road, San Jose, California 95134-2127, as referenced in the instant specification).

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