Positive resist composition and method for forming resist...

Details Positive resist composition and method for forming resist... Positive resist composition and method for forming resist...

2006-04-07

2010-10-19

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S910000, C430S921000, C430S922000

Reexamination Certificate

active

07816066

ABSTRACT:
A positive resist composition includes a resin component (A), and an acid generator component (B) which generates an acid upon exposure and includes an acid generator (B1) represented by general formula (B1):(wherein R51represents a straight chain, branched chain, or cyclic alkyl group, or a straight chain, branched chain, or cyclic fluorinated alkyl group; R52represents a hydrogen atom, a hydroxyl group, a halogen atom, a straight chain, branched chain, or cyclic alkyl group, a straight chain or branched chain halogenated alkyl group, or a straight chain or branched chain alkoxy group; R53represents an aryl group which may include a substituent; and n represents an integer from 1 to 3).

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International Search Report from PCT/JP2006/307478, mailed May 2, 2006.
Office Action issued on counterpart Chinese Application No. 200680019830.2, dated Aug. 17, 2010.

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