Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2007-03-09
2010-11-30
Berman, Jack I (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S492200, C378S034000
Reexamination Certificate
active
07842936
ABSTRACT:
The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising grid cells, said pattern comprising features of a size larger than that of a grid cell, in each of which cells said probe is switched “on” or “off, wherein a probe on said target covers a significantly larger surface area than a grid cell, and wherein within a feature a position dependent distribution of black and white writings is effected within the range of the probe size as well as to a method upon which such system may be based.
REFERENCES:
patent: 4498010 (1985-02-01), Biechler et al.
patent: 5103101 (1992-04-01), Berglund et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5393987 (1995-02-01), Abboud et al.
patent: 6433348 (2002-08-01), Abboud et al.
patent: 6565386 (2003-05-01), Yoneyama et al.
patent: 2004/0135983 (2004-07-01), Wieland et al.
patent: 2005/0104013 (2005-05-01), Stengl et al.
patent: 2008/0054184 (2008-03-01), Knippelmeyer et al.
patent: WO 2004/038509 (2004-05-01), None
Jager Remco
Kruit Pieter
Steenbrink Stijn Willem Karel Herman
Wieland Marco Jan-Jaco
Berman Jack I
Blakely & Sokoloff, Taylor & Zafman
Ippolito Rausch Nicole
Mapper Lithography IP B.V.
LandOfFree
Lithography system and projection method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithography system and projection method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography system and projection method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4151782