Method of manufacturing semiconductor substrates and...

Details Method of manufacturing semiconductor substrates and... Method of manufacturing semiconductor substrates and...

2005-10-31

2009-06-30

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S438000, C257S347000, C257SE29273, C257SE21411, C257SE21215

Reexamination Certificate

active

07553713

ABSTRACT:
A semiconductor substrate includes a semiconductor base substrate that has an oxide film selectively formed on a part thereof, the oxide film having a non-uniform thickness; and a semiconductor layer that is formed on the oxide film by epitaxial growth so as to have a non-uniform thickness.

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Sakai, et al., “Separation by Bonding Si Islands (SBSI) for LSI Applications.” Second International SiGe Technology and Device Meeting Abstract, pp. 230-231, May 2004.

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