Plasma processing apparatus having impedance varying electrodes

Details Plasma processing apparatus having impedance varying electrodes Plasma processing apparatus having impedance varying electrodes

2007-03-27

2009-11-03

Vo, Tuyet (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C156S345480, C156S345470, C118S7230IR, C118S7230ER, C118S7230IR, C315S111710, C315S111410

Reexamination Certificate

active

07611603

ABSTRACT:
There is provided a plasma processing apparatus which processes a substrate by generating plasma in a process vessel by supply of radio frequency power from a radio frequency power source to at least one of a pair of vertically opposed electrodes disposed in the process vessel, the apparatus including an impedance varying circuit which is connected to at least one of the pair of electrodes and in which an impedance varying part varying impedance on the electrode side of the plasma generated in the process vessel and a resistor are connected in series.

REFERENCES:
patent: 2002/0132380 (2002-09-01), Nakano et al.
patent: 2004/0035365 (2004-02-01), Yamazawa et al.
patent: 2006/0112878 (2006-06-01), Ni et al.
patent: 2004-96066 (2004-03-01), None

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