Chemically amplified resist material, topcoat film material...

Details Chemically amplified resist material, topcoat film material... Chemically amplified resist material, topcoat film material...

2008-01-03

2009-06-02

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S273100, C430S326000, C430S330000

Reexamination Certificate

active

07541132

ABSTRACT:
A resist film made of a chemically amplified resist material including a polymer; a photo-acid generator and carbamoyl oxime is formed on a substrate. Subsequently, pattern exposure is performed by selectively irradiating the resist film with exposing light. After the pattern exposure, the resist film is baked, and the baked resist film is developed, so as to form a resist pattern made of the resist film.

REFERENCES:
patent: 5650261 (1997-07-01), Winkle
patent: 5691100 (1997-11-01), Kudo et al.
patent: 6746828 (2004-06-01), Richter et al.
patent: 2006/0263702 (2006-11-01), Yamashita et al.
patent: 2007/0243487 (2007-10-01), Anze et al.
Yoon et al. “Influence of Resin Properties to Resist Performance at ArF Lithography”, Proceedings of SPIE, vol. 5376, pp. 583-590, 2004.

Affiliated with

Also associated with

Rating

Chemically amplified resist material, topcoat film material... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemically amplified resist material, topcoat film material..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemically amplified resist material, topcoat film material... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4141208