Method and device for growing pseudomorphic AlInAsSb on InAs

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

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C257S015000, C257SE29072

Reexamination Certificate

active

07598158

ABSTRACT:
A semiconductor device and method are being disclosed. The semiconductor device discloses an InAs layer, a plurality of group III-V ternary layers supported by the InAs layer, and a plurality of group III-V quarternary layers supported by the InAs layer, wherein the group III-V ternary layers are separated from each other by a single group III-V quarternary layer. The method discloses providing an InAs layer, growing a plurality of group III-V ternary layers, and growing a plurality of group III-V quarternary layers, wherein the group III-V ternary layers are separated from each other by a single group III-V quarternary layer and are supported by the InAs layer.

REFERENCES:
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Mathis, S.K., et al., J. Appl. Phys. 89, 2458 (2001).
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Turner, G.W., et al., J. Cryst.Growth 175/176, 825 (1997).
Washington, D., et al., Journal of Vac. Sci. Technol., B16, 1385 (1998).
Wilk, A., et al., J. Cryst.Growth 227/228, 586 (2001).

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