Method and system for using pattern matching to process an...

Details Method and system for using pattern matching to process an... Method and system for using pattern matching to process an...

2006-06-14

2009-06-30

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07555736

ABSTRACT:
Disclosed is a method, system, and computer program product for processing design objects, such as vias, for an integrated circuit design. In one approach, pattern matching is employed to perform DRC/LVS for scattering bars and Vias. A library of via combinations can be used to insert scattering bars into design. This approach of using a library can be applied to other structures in design in addition to vias.

REFERENCES:
patent: 6311319 (2001-10-01), Tu et al.
patent: 2005/0142449 (2005-06-01), Shi et al.
International Search Report and Written Opinion dated May 8, 2008 for PCT/US06/23213.

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