Positive photoresist composition with a polymer including a...

Details Positive photoresist composition with a polymer including a... Positive photoresist composition with a polymer including a...

2006-05-23

2009-12-29

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S170000, C430S270100, C430S326000, C430S905000, C430S907000, C430S910000

Reexamination Certificate

active

07638264

ABSTRACT:
A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.

REFERENCES:
patent: 6165678 (2000-12-01), Allen et al.
patent: 6177228 (2001-01-01), Allen et al.
patent: 6235849 (2001-05-01), Jayaraman et al.
patent: 6420503 (2002-07-01), Jayaraman et al.
patent: 6706826 (2004-03-01), Fujiwara et al.
patent: 6824956 (2004-11-01), Sato
patent: 1074566 (2001-07-01), None

Affiliated with

Also associated with

Rating

Positive photoresist composition with a polymer including a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist composition with a polymer including a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist composition with a polymer including a... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4133365