Method for pre-treating epitaxial layer, method for...

Semiconductor device manufacturing: process – With measuring or testing – Electrical characteristic sensed

Reexamination Certificate

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C438S014000, C438S018000, C438S787000, C438S788000, C257SE21521

Reexamination Certificate

active

07618833

ABSTRACT:
A method for pre-treating an epitaxial layer performed before evaluation of the epitaxial layer by making the epitaxial layer contact with a metal electrode by a capacitance-voltage measurement, the method comprising; applying carbon-bearing compound to a surface of the epitaxial layer; subsequently irradiating ultraviolet light to the surface of the epitaxial layer; and thereby forming an oxide film on the surface of the epitaxial layer.

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patent: H6-140478 (1994-05-01), None
patent: 2002-516486 (2002-06-01), None
patent: 2002-516486 (2004-06-01), None
patent: WO 99/60615 (1999-11-01), None

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