Surface form measuring apparatus and stress measuring...

Details Surface form measuring apparatus and stress measuring... Surface form measuring apparatus and stress measuring...

2007-10-31

2009-11-03

Stafira, Michael P (Department: 2886)

Optics: measuring and testing

Material strain analysis

Reexamination Certificate

active

07612873

ABSTRACT:
In a stress measuring apparatus, reflected light of light emitted to a substrate through an objective lens is received by a light shielding pattern imaging part, to acquire an image of a light shielding pattern positioned at an aperture stop part of an optical system. A control part obtains gradient vectors of the substrate in a plurality of gradient vector measurement areas and surface form of the substrate on the basis of outputs of the light shielding pattern imaging part, to obtain a stress in a film formed on the substrate. Since light directed through the objective lens becomes approximately parallel rays of light on the substrate, measurement can be performed without focusing on each gradient vector measurement area and the surface form of the substrate can be obtained easily and rapidly. Consequently, it is possible to obtain a stress in the film formed on the substrate easily and rapidly.

REFERENCES:
patent: 2004/0075836 (2004-04-01), Horie et al.
patent: 2008/0075328 (2008-03-01), Sciammarella
patent: 2000-9553 (2000-01-01), None
patent: 2004-138519 (2004-05-01), None

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