Solid-state image pickup device and method of manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S446000

Reexamination Certificate

active

07554141

ABSTRACT:
A solid-state image pickup device comprising a semiconductor substrate which comprises a substrate body containing P-type impurities and a first N-type semiconductor layer containing N-type impurities, the first N-type semiconductor layer being provided on the substrate body, and including a first P-type semiconductor layer which contains p-type impurities, and which is located on the substrate body, a plurality of optical/electrical conversion portions formed of second N-type semiconductor layers which are provided independently of each other in respective positions in a surface portion of the first N-type semiconductor layer, and a plurality of second P-type semiconductor layers which are formed to surround the optical/electrical conversion portions, which are provided along element isolation regions provided in respective positions in the surface portion of the first N-type semiconductor layer, and which continuously extend from the surface portion of the first N-type semiconductor layer to a surface portion of the first P-type semiconductor layer.

REFERENCES:
patent: 6521920 (2003-02-01), Abe
patent: 6677627 (2004-01-01), Miida
patent: 6825516 (2004-11-01), Rhodes
patent: 7154137 (2006-12-01), Nozaki
patent: 7307300 (2007-12-01), Inoue
patent: 2004/0094784 (2004-05-01), Rhodes et al.
patent: 2001-160620 (2001-06-01), None
patent: 2001-223351 (2001-08-01), None

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