Filament support arrangement for substrate heating apparatus

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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C219S461100

Reexamination Certificate

active

07573004

ABSTRACT:
Apparatus for supporting the heater filament of the reactor in Chemical Vapor Deposition (CVD) system. The apparatus includes a recess or aperture disposed in a filament support plate; an electrically isolated rod supporting at least one of the coils of the filament, and extends into the recess or aperture in the support plate. A thermally insulating sleeve surrounds the rod. The post and sleeve arrangement provide a controlled and adjustable amount of lateral and vertical movement to the rod and filament to prevent damage to the filament caused by thermal expansion while providing lateral and vertical support to the filament.

REFERENCES:
patent: 3345498 (1967-10-01), Siegla
patent: 3567906 (1971-03-01), Hurko
patent: 3749883 (1973-07-01), Vodvarka et al.
patent: 3991298 (1976-11-01), Maake
patent: 4292504 (1981-09-01), Gebarowski et al.
patent: 4864105 (1989-09-01), Morgan et al.

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