Method for verifying optical proximity correction using...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000, C716S030000

Reexamination Certificate

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07546564

ABSTRACT:
A method for verifying optical proximity correction (OPC) using a layer-versus-layer (LVL) comparison. The method includes performing optical proximity correction of an original design of a semiconductor device to prepare a revised design of the semiconductor device; comparing the revised design and the original design with each other; dividing deviation patterns, obtained by results of the comparison, according to an illuminating system; and comparing the divided deviation patterns respectively to reference values to determine whether or not any error in the optical proximity correction occurs.

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