Pattern inspection system using image correction scheme with...

Details Pattern inspection system using image correction scheme with... Pattern inspection system using image correction scheme with...

2006-02-24

2009-02-03

Dinh, Paul (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C382S144000

Reexamination Certificate

active

07487491

ABSTRACT:
An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.

REFERENCES:
patent: 7117477 (2006-10-01), Ye et al.
patent: 2002/0188917 (2002-12-01), Yokoyama et al.
patent: 2006/0018530 (2006-01-01), Oaki et al.
patent: 8-76359 (1996-03-01), None
patent: 10-96613 (1998-04-01), None
patent: 2000-105832 (2000-04-01), None
patent: 2000-241136 (2000-09-01), None
patent: 2006-30518 (2006-02-01), None
U.S. Appl. No. 11/360,580, filed Feb. 24, 2006 Oaki, et al.
U.S. Appl. No. 11/567,550, filed Dec. 6, 2006 Oaki.
U.S. Appl. No. 11/567,520, filed Dec. 6, 2006 Oaki.
U.S. Appl. No. 11/386,744, filed Mar. 23, 2006 Sugihara, et al.

Affiliated with

Also associated with

Rating

Pattern inspection system using image correction scheme with... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern inspection system using image correction scheme with..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern inspection system using image correction scheme with... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4109827