Resist composition and patterning process

Details Resist composition and patterning process Resist composition and patterning process

2008-09-23

2009-11-24

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S910000, C430S326000, C430S325000, C430S330000, C430S942000

Reexamination Certificate

active

07622242

ABSTRACT:
A resist composition comprises a base polymer which changes its alkali solubility under the action of an acid, and an additive copolymer comprising recurring units (a) and (b). R1is F or CF3, R2and R3are H or alkyl or form a ring, R4is H or an acid labile group, R5to R6are H, F, or alkyl, or two of R5to R8may together form a ring, m=0 or 1, 0.2≦a≦0.8, and 0.1≦b≦0.6. A resist film of the composition has good barrier property against water so that leaching of the resist film with water is controlled, minimizing a change of pattern profile due to leach-out.

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