Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-09-01
2009-10-27
Pham, Long (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S401000, C257S072000, C257S369000, C257S773000, C257S775000
Reexamination Certificate
active
07608891
ABSTRACT:
A thin film transistor includes a one conductive type semiconductor layer (11); a source region (12) and a drain region (13) which are separately provided in the semiconductor layer; and a gate electrode (14) provided above or below the semiconductor layer with an insulating film interposed therebetween, wherein the width (Ws) of the junction face between the source region and the channel (16) which is provided between the source region and drain region, is different from the width (Wd) of the junction face between the above channel region and the drain region.
REFERENCES:
patent: 5385865 (1995-01-01), Nieder et al.
patent: 6770936 (2004-08-01), Inoue et al.
patent: 6806498 (2004-10-01), Taketomi et al.
patent: 57-172770 (1982-10-01), None
patent: 62-45070 (1987-02-01), None
patent: 05-048095 (1993-02-01), None
patent: 2000-133807 (2000-05-01), None
The first Official Action issued against the corresponding application in China. (Chinese Language) Feb. 9, 2007.
Hiramatsu Masato
Kimura Yoshinobu
Matsumura Masakiyo
Nishitani Mikihiko
Yamamoto Yoshitaka
Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center
Pham Long
Stoel Rives LLP
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