Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2004-01-23
2009-02-10
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C560S256000, C525S282000, C430S910000, C430S157000
Reexamination Certificate
active
07488565
ABSTRACT:
Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane series; for example, diamantane, triamantane, tetramantane, pentamantane, hexamantane, etc. The diamondoid-containing pendant group may have hydrophilic-enhancing substituents such as a hydroxyl group, and may contain a lactone group. Advantages of the present compositions include enhanced resolution, sensitivity, and adhesion to the substrate.
REFERENCES:
patent: 5019660 (1991-05-01), Chapman et al.
patent: 5166313 (1992-11-01), Archibald et al.
patent: 5268513 (1993-12-01), Shen et al.
patent: 5399647 (1995-03-01), Nozaki
patent: 5430193 (1995-07-01), Shen
patent: 5510549 (1996-04-01), Ashjian et al.
patent: 5621019 (1997-04-01), Nakano et al.
patent: 5665518 (1997-09-01), Maeda et al.
patent: 5691111 (1997-11-01), Iwasa et al.
patent: 5756850 (1998-05-01), Iwasa et al.
patent: 5929271 (1999-07-01), Hada et al.
patent: 6013416 (2000-01-01), Nozaki et al.
patent: 6042991 (2000-03-01), Aoai et al.
patent: 6071670 (2000-06-01), Ushirogouchi et al.
patent: 6077644 (2000-06-01), Hada et al.
patent: 6087063 (2000-07-01), Hada et al.
patent: 6103445 (2000-08-01), Wilson et al.
patent: 6114085 (2000-09-01), Padmanaban et al.
patent: 6120977 (2000-09-01), Kaimoto et al.
patent: 6124074 (2000-09-01), Varanasi et al.
patent: 6136501 (2000-10-01), Trefonas, III et al.
patent: 6200724 (2001-03-01), Namiki et al.
patent: 6200728 (2001-03-01), Cameron et al.
patent: 6225019 (2001-05-01), Matsuda et al.
patent: 6225476 (2001-05-01), Hada et al.
patent: 6238842 (2001-05-01), Sato et al.
patent: 6245485 (2001-06-01), Aoai et al.
patent: 6251569 (2001-06-01), Angelopoulos et al.
patent: 6268106 (2001-07-01), Park et al.
patent: 6291130 (2001-09-01), Kodama et al.
patent: 6303266 (2001-10-01), Okino et al.
patent: 6306554 (2001-10-01), Barclay et al.
patent: 6313327 (2001-11-01), Seo et al.
patent: 6344590 (2002-02-01), Nakano et al.
patent: 6380270 (2002-04-01), Yates
patent: 6383713 (2002-05-01), Uetani et al.
patent: 6388101 (2002-05-01), Hada et al.
patent: 6391520 (2002-05-01), Nakano et al.
patent: 6403280 (2002-06-01), Yamahara et al.
patent: 6403823 (2002-06-01), Hasegawa et al.
patent: 6416925 (2002-07-01), Aoai et al.
patent: 6440636 (2002-08-01), Ushirogouchi et al.
patent: 6462158 (2002-10-01), Miwa et al.
patent: 6465137 (2002-10-01), Watanabe et al.
patent: 6479211 (2002-11-01), Sato et al.
patent: 6486330 (2002-11-01), Nakano
patent: 6489082 (2002-12-01), Hattori et al.
patent: 6492086 (2002-12-01), Barclay et al.
patent: 6498226 (2002-12-01), Cheng et al.
patent: 6517991 (2003-02-01), Kodama et al.
patent: 6548221 (2003-04-01), Uetani et al.
patent: 6552143 (2003-04-01), Funaki et al.
patent: 6555289 (2003-04-01), Sasaki et al.
patent: 6562554 (2003-05-01), Varanasi et al.
patent: 6566038 (2003-05-01), Nishi et al.
patent: 2001/0003640 (2001-06-01), Takechi et al.
patent: 2001/0014428 (2001-08-01), Uetani et al.
patent: 2001/0016298 (2001-08-01), Nakanishi et al.
patent: 2001/0026901 (2001-10-01), Maeda et al.
patent: 2002/0016414 (2002-02-01), Lau et al.
patent: 2002/0016516 (2002-02-01), Nakano et al.
patent: 2002/0037472 (2002-03-01), Zampini et al.
patent: 2002/0048720 (2002-04-01), Sasaki et al.
patent: 2002/0048725 (2002-04-01), Oshima
patent: 2002/0064727 (2002-05-01), Sato
patent: 2002/0076543 (2002-06-01), Sikonia
patent: 2002/0099147 (2002-07-01), Yoshida et al.
patent: 2002/0120090 (2002-08-01), Cheng et al.
patent: 2002/0123010 (2002-09-01), Angelopoulos et al.
patent: 2002/0130407 (2002-09-01), Dahl et al.
patent: 2002/0132181 (2002-09-01), Nishimura et al.
patent: 2002/0134301 (2002-09-01), Dahl et al.
patent: 2002/0136987 (2002-09-01), Oshima
patent: 2002/0137976 (2002-09-01), Dahl et al.
patent: 2002/0139295 (2002-10-01), Dahl et al.
patent: 2002/0143217 (2002-10-01), Dahl et al.
patent: 2002/0143218 (2002-10-01), Dahl et al.
patent: 2002/0147373 (2002-10-01), Dahl et al.
patent: 2002/0169266 (2002-11-01), Funaki et al.
patent: 2002/0177743 (2002-11-01), Dahl et al.
patent: 2002/0182360 (2002-12-01), Koshiyama et al.
patent: 2002/0182534 (2002-12-01), Varanasi et al.
patent: 2002/0187420 (2002-12-01), Barclay et al.
patent: 2002/0188163 (2002-12-01), Dahl et al.
patent: 2002/0193648 (2002-12-01), Dahl et al.
patent: 2003/0008241 (2003-01-01), Sato et al.
patent: 2003/0017415 (2003-01-01), Kodama et al.
patent: 2003/0017635 (2003-01-01), Apen et al.
patent: 2003/0031789 (2003-02-01), Bedwell et al.
patent: 2003/0031949 (2003-02-01), Barclay et al.
patent: 2003/0031950 (2003-02-01), Uenishi et al.
patent: 2003/0044717 (2003-03-01), Kodama
patent: 2003/0044718 (2003-03-01), Kodama et al.
patent: 2003/0059710 (2003-03-01), Inoue
patent: 2003/0064327 (2003-04-01), Rottstegge
patent: 2003/0068585 (2003-04-01), Rottstegge
patent: 2003/0073027 (2003-04-01), Namiki et al.
patent: 2003/0077540 (2003-04-01), Kodama et al.
patent: 2003/0077543 (2003-04-01), Sato
patent: 2003/0102285 (2003-06-01), Nozaki et al.
patent: 2003/0105264 (2003-06-01), Bedwell et al.
patent: 2003/0108809 (2003-06-01), Sato
patent: 2003/0114598 (2003-06-01), Li et al.
patent: 2003/0134225 (2003-07-01), Fujimori et al.
patent: 2003/0148206 (2003-08-01), Kodama
patent: 2003/0148210 (2003-08-01), Funaki et al.
patent: 2004/0021204 (2004-02-01), Liu et al.
patent: 2004/0059145 (2004-03-01), Liu et al.
patent: 2004/0109328 (2004-06-01), Dahl et al.
patent: 2005/0100819 (2005-05-01), Fuji et al.
patent: 2005/0112494 (2005-05-01), Yao et al.
patent: 2005/0147915 (2005-07-01), Dammel
patent: WO 92/13909 (1992-08-01), None
patent: WO-01/78110 (2001-10-01), None
patent: WO 02/057201 (2002-07-01), None
patent: WO-02/57201 (2002-07-01), None
patent: WO-02/057202 (2002-07-01), None
patent: WO 02/058139 (2002-07-01), None
patent: WO 02/088077 (2002-11-01), None
patent: WO 03/050066 (2003-06-01), None
patent: WO 2004/009577 (2004-01-01), None
Wang et al, Journal of Polymer Science: Part A: Polymer Chemistry, vol. 34, pp. 3345-3354, (1996—no month given).
Liaw, Der-Jang, “Synthesis and characterization of new polyamides and polyimides prepared from 2,2-bis[4-(4-aminophenoxy)phenyl]adamantane,”Macromol. Chem. Phys.200. No. 6, pp. 1326-1332 (1999).
Nozaki, Koji et al., “High-Performance Resist Materials for ArF Excimer Laser and Electron Beam Lithography,”Fujitsu Sci Tech. J., 38, 1, pp. 3-12 (Jun. 2002).
Padmanaban, Munirathna, et al., “Etch Properties of 193nm Resists: Issues and Approaches,”Journal of Photopolymer Science and Technology, vol. 15, No. 3 (2002), pp. 521-528.
Padmanaban, Munirathna, et al., “Layer-Specific Resists for 193nm Lithography,”Journal of Photopolymer Science and Technology, vol. 13, No. 4 (2000) pp. 607-616.
Paniez, P. J., et al., “Thermal Phenomena in Acryllic 193 nm Resists,” SPIE Conferences on Advances in Resist Technology and Processing XVI, Santa Clara, CA,SPIEvol. 3678 pp. 1352-1363.
Shida, Naomi, “Advanced Materials for 193-nm Resists,”Journal of Photopolymer Science and Technology, vol. 13, No. 4 (2000) pp. 601-606.
Ushirogouchi, Tohru, et al., “Advanced Materials for 193-nm Resists,” InAdvances in Resist Technology and Processing XVII, Francis M. Houlihan, Editor, Proceedings of SPIE vol. 3999 (2000) pp. 1147-1156.
Gund, T.M., et al., “The Functionalization of Diamantane (Congressane)”,Tetrahedron Letters56:4875-4878 (1970).
Wang, Jane-Jen, et al., “Synthesis and Characterization of New Poly(N-1-adamantylmaleimide) and Poly(N-1-diamantylmaleimide)”,Journal of Polymer Science: Part A: Polymer Chemistry34:3345-3354 (1996).
Cupus, et al., “Congressane”,Journal of the American Chemical Society87(4):917-918 (1965).
Search results from PCT/US04/31929 mailed Jul. 5, 2005.
Williams, Van Zandt, Jr., et al., “Triamantane”,Journal of the American Chemical Society88(16):3862-3863 (1996).
International Search Report from PCT/US04/31929 mailed N
Carlson Robert M.
Dahl Jeremy E.
Liu Shenggao
Chevron U.S.A. Inc.
Crowell & Moring LLP
Hamilton Cynthia
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