Polymers, positive resist compositions and patterning process

Details Polymers, positive resist compositions and patterning process Polymers, positive resist compositions and patterning process

2007-03-05

2009-02-17

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S330000, C430S905000, C430S910000, C526S281000, C526S284000

Reexamination Certificate

active

07491483

ABSTRACT:
A polymer is composed of recurring units of hydroxyvinylnaphthalene, (meth)acrylic units having a lactone ring fused to a bridged ring, and (meth)acrylic units having acid labile groups. A positive resist composition comprising the polymer as a base resin, when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development.

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