Photoresist composition with antibacterial agent

Details Photoresist composition with antibacterial agent Photoresist composition with antibacterial agent

Filed on

2006-07-25

Date issued

2009-12-22

Examiner

Walke, Amanda C. (Department: 1795)

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

C430S311000, C430S314000, C430S905000, C430S913000, C430S926000

Type

Reexamination Certificate

Status

active

Patent number

07635552

Description

ABSTRACT:
A photoresist composition, e.g., a positive acting resist, for use in the formation of circuit patterns and the like on printed circuit boards and the like circuitized substrates, the photoresist composition including a quantity of silver therein in a sufficient amount to substantially prevent bacteria formation within said composition. A method of making the composition is also provided.

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