Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-11-21
2009-08-04
Doan, Theresa T (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S401000, C257SE29105, C257SE29112, C438S284000, C438S286000
Reexamination Certificate
active
07569883
ABSTRACT:
Power electronic MOS device of the type comprising a plurality of elementary power MOS transistors and a gate structure comprising a plurality of conductive strips realized with a first conductive material such as polysilicon, a plurality of gate fingers or metallic tracks connected to a gate pad and at least a connection layer arranged in series to at least one of said conductive strip. Such gate structure comprising at least a plurality of independent islands formed on the upper surface of the conductive strips and suitably formed on the connection layers. Said islands being realized with at least one second conductive material such as silicide.
REFERENCES:
patent: 4145700 (1979-03-01), Jambotkar
patent: 4318759 (1982-03-01), Trenary et al.
patent: 5254494 (1993-10-01), Van Der Plas et al.
patent: 5445978 (1995-08-01), Yilmaz
patent: 5510281 (1996-04-01), Ghezzo et al.
patent: 5814859 (1998-09-01), Ghezzo et al.
patent: 5933734 (1999-08-01), Ferla et al.
patent: 5981343 (1999-11-01), Magri et al.
patent: 6215152 (2001-04-01), Herbert
patent: 6222232 (2001-04-01), Magri et al.
patent: 6326271 (2001-12-01), Magri et al.
patent: 6423986 (2002-07-01), Zhao
patent: 6596609 (2003-07-01), Cheng et al.
patent: 6979863 (2005-12-01), Ryu
patent: 2002/0093033 (2002-07-01), Zommer et al.
patent: 2002/0140042 (2002-10-01), Stout
patent: 2003/0057497 (2003-03-01), Higashida et al.
patent: 2004/0031981 (2004-02-01), Grivna
patent: 2004/0142531 (2004-07-01), Chan et al.
patent: 2004/0185646 (2004-09-01), Herzum
patent: 2005/0145852 (2005-07-01), Kumar et al.
patent: 2006/0086974 (2006-04-01), Balakrishnan
patent: WO 99/33119 (1999-07-01), None
Shenai k et al.: “Selectively Silicided Vertical Power Dougle-Diffused Metal Oxide Semiconductor Field Effect Transistors for High Frequence Power Switchting Applications”. Journal of Vacuum Science and technology Part B. vole 6, No. 6 Nov. 1988. pp. 1740-1745.
Patent Abstract of Japan vol. 1997, No. 07, Jul. 31, 1997 JP 09 082965 A, Mar. 28, 1997, Yokogawa Electric Corp.
European Search Report for EP 05 02 5288 dated Feb. 21, 2006.
Shenai k et al.: “Selectively Silicided Vertical Power Double-Diffused Metal-Oxide Semiconductor Field Effect Transistors for High-Frequency Power Switching Applications”, Journal of Vacuum Science and technology Part B, vol. 6, No. 6, Nov. 1988, pp. 1740-1745.
European Search Report for EP 05 02 5285 dated Mar. 3, 2006.
European Search Report for EP 05 02 5287 dated May 29, 2006.
Berger, Wayne, et al., RF-LDMOS: A Device Technology for High Power RF Infrastructure Applications, XP010767463, IEEE pp. 189-192, Oct. 24, 2004.
Antipov I, Mask-Independent Short Channel MOS, XP000671029, IBM Technical Disclosure bulletin, vol. 21, No. 12, pp. 4852-4854, May 1, 1979.
Bazzano Gaetano
Ferla Giuseppe
Frisina Ferruccio
Grimaldi Antonio Giuseppe
Magri Angelo
Doan Theresa T
Graybeal Jackson LLP
Salerno Sarah K
STMicroelectronics S.r.l.
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