Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-09-12
2009-06-16
Lin, Sun J (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
07549141
ABSTRACT:
A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.
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Ikuta Yoshiaki
Kojima Hiroshi
Otsuka Kouji
Asahi Glass Company Ltd.
Lin Sun J
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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