Structure for pattern formation, method for pattern...

Details Structure for pattern formation, method for pattern... Structure for pattern formation, method for pattern...

2001-06-15

2009-08-18

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S007000, C430S302000, C430S303000

Reexamination Certificate

active

07575845

ABSTRACT:
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

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Notice of Rejection of Japanese Patent Application No. 2001-395028 issued on Oct. 12, 2004 with its English translation and the following cited references therein: Akira Fujishima, Tamihiko Kato, Eturo Maekawa and Kenichi Honda, “Image Formation on a Treated TiO2 Anode to be Hydrophobic,” Journal of Denki Kagaku, vol. 54, No. 2, pp. 153-158 (1986).
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