Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-11-08

2009-11-17

Nguyen, Sang (Department: 2886)

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

C250S231130, C250S231140, C250S491100, C356S615000

Reexamination Certificate

active

07619207

ABSTRACT:
The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.

REFERENCES:
patent: 4709146 (1987-11-01), Reitsema
patent: 7002137 (2006-02-01), Thorburn et al.
patent: 7067797 (2006-06-01), Mitchell et al.
patent: 7126109 (2006-10-01), Goldman et al.
patent: 7321113 (2008-01-01), Hare et al.
patent: 7348574 (2008-03-01), Pril et al.
patent: 7362446 (2008-04-01), Van Der Pasch et al.

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