Reticle, exposure apparatus, and methods for measuring the...

Details Reticle, exposure apparatus, and methods for measuring the... Reticle, exposure apparatus, and methods for measuring the...

2005-11-03

2009-06-09

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S072000, C355S075000, C356S401000

Reexamination Certificate

active

07545480

ABSTRACT:
A reticle and an exposure apparatus using the reticle are provided. The reticle includes alignment marks having a plurality of segments along coordinate directions corresponding to a plurality of regions of the reticle, in symmetrical positions about coordinate axes. The reticle also includes detection sensors having detection regions corresponding to a mirror image of the alignment marks of the reticle. Accordingly, it is possible to prevent alignment errors generated due to aberration of a lens from being different on different sides of each coordinate axis, thus enabling more precise reticle alignment and therefore overlay alignment.

REFERENCES:
patent: 6269322 (2001-07-01), Templeton et al.
patent: 2002/0041368 (2002-04-01), Ota et al.
patent: 1998-21238 (1998-06-01), None
patent: 2000-0001960 (2000-01-01), None
patent: 2000-51889 (2000-08-01), None
English language abstract of Korean Publication No. 1998-21238.
English language abstract of Korean Publication No. 2000-51889.

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