Etchant and method for fabricating liquid crystal display...

Details Etchant and method for fabricating liquid crystal display... Etchant and method for fabricating liquid crystal display...

2006-07-13

2009-10-27

Deo, Duy-Vu N (Department: 1792)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S754000, C216S083000, C216S084000, C216S100000, C216S101000, C216S105000

Reexamination Certificate

active

07608547

ABSTRACT:
Provided are an etchant used for a transparent conductive oxide layer and a method for fabricating a liquid crystal display (LCD) using the etchant. The etchant includes 2-5 wt % sulfuric acid, 0.02-10 wt % hydrogen sulfate of alkali metal, and deionized water as the remainder.

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Patent Abstracts of Japan, Publication No. 10-178177, Jun. 30, 1998, 1 p.
Patent Abstracts of Japan, Publication No. 2000-008184, Jan. 11, 2000, 1 p.
CN Office Action of Mar. 13, 2009 for Application No. 200610099011.5.

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