Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal
Reexamination Certificate
2006-11-22
2009-06-16
Lee, Hsien-ming (Department: 2823)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
C438S084000, C438S102000
Reexamination Certificate
active
07547569
ABSTRACT:
A processing method described herein provides a method of patterning a MoSe2and/or Mo material, for example a layer of such material(s) in a thin-film structure. According to one aspect, the invention relates to etch solutions that can effectively etch through Mo and/or MoSe2. According to another aspect, the invention relates to etching such materials when such materials are processed with other materials in a thin film photovoltaic device. According to other aspects, the invention includes a process of etching Mo and/or MoSe2with selectivity to a layer of CIGS material in an overall process flow. According to still further aspects, the invention relates to Mo and/or MoSe2etch solutions that are useful in an overall photolithographic process for forming a photovoltaic cell and/or interconnects and test structures in a photovoltaic device.
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“Etch,” definition from Dictionary.com, Feb. 21, 2008.
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Borden Peter G.
Weidman Timothy
Xu Li
Applied Materials Inc.
Lee Hsien-ming
Parendo Kevin
Pillsbury Winthrop Shaw & Pittman LLP
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