Method and system for enhanced lithographic alignment

Details Method and system for enhanced lithographic alignment Method and system for enhanced lithographic alignment

2006-03-08

2009-10-06

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S022000, C430S313000, C430S328000, C257S797000, C438S401000, C438S975000

Reexamination Certificate

active

07598024

ABSTRACT:
A method for alignment mark preservation includes a step of preparing a lower alignment mark structure on a substrate. In one configuration of the invention, the alignment mark structure includes a lower trench. In a further step, a hard mask coating is applied to a substrate that includes the alignment marks. Preferably, the hard mask material is an amorphous carbon material. In a further step, a selected portion of the hard mask located above the lower alignment mark structure is exposed to a dose of radiation. In one aspect of the invention, the surface of regions of the hard mask coating that receive the dose of radiation become elevated with respect to other regions of the hard mask surface. For those elevated regions of the hard mask that are aligned with an underlying alignment mark trench, the elevated regions serve as an alignment mark that preserves the original horizontal position of the underlying alignment mark.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 2005/0079120 (2005-04-01), Fujita et al.
patent: 2007/0212648 (2007-09-01), Lalbahadoersing et al.
patent: 98/33096 (1998-07-01), None
patent: 98/38597 (1998-09-01), None
patent: 98/40791 (1998-09-01), None
Seth et al., “Lithographic application of diamond-like carbon films”, Thin Solid Films, 254, pp. 92-95 (1995).

Affiliated with

Also associated with

Rating

Method and system for enhanced lithographic alignment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for enhanced lithographic alignment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for enhanced lithographic alignment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4064806