Positive resist composition, method of forming resist...

Details Positive resist composition, method of forming resist... Positive resist composition, method of forming resist...

2008-08-05

2009-10-20

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S910000, C526S280000, C526S281000, C526S284000

Reexamination Certificate

active

07604920

ABSTRACT:
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:wherein R1represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2represents an acid dissociable, dissolution inhibiting group.

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