Resist composition, method of forming resist pattern,...

Details Resist composition, method of forming resist pattern,... Resist composition, method of forming resist pattern,...

2005-09-29

2008-11-18

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S192000, C430S326000, C430S330000

Reexamination Certificate

active

07452657

ABSTRACT:
The resist composition of the present invention contains at least one of a tannin and a derivative thereof. The method of forming a resist pattern of the present invention includes: forming a resist film on a surface of an object to be processed, by using the resist composition; and exposing and developing the resist film. The method of manufacturing a semiconductor device of the present invention includes: forming a resist film on a surface of an object to be processed, by using the resist composition; exposing and developing the resist film to form a resist pattern; and patterning the surface of the object by performing an etching through the resist pattern as a mask.

REFERENCES:
patent: 3853559 (1974-12-01), Levinos et al.
patent: 4174222 (1979-11-01), Komine et al.
patent: 4536465 (1985-08-01), Uehara
patent: 5173117 (1992-12-01), Inokawa et al.
patent: 5183722 (1993-02-01), Tsutsumi et al.
patent: 6156476 (2000-12-01), Takeyama et al.
patent: 6291059 (2001-09-01), Mahoney
patent: 2004/0121259 (2004-06-01), Kozawa et al.
patent: 51075435 (1976-06-01), None
patent: 53-115301 (1978-10-01), None
patent: 04266901 (1992-09-01), None
patent: 07-128843 (1995-05-01), None
patent: 07-128853 (1995-05-01), None
patent: 07-209858 (1995-08-01), None
patent: 10-003165 (1998-01-01), None
patent: 2000-98630 (2000-04-01), None
patent: 2002-47375 (2002-02-01), None
patent: 2002-053699 (2002-02-01), None
patent: 3275367 (2002-02-01), None
patent: 2004-0026128 (2004-03-01), None
patent: 9711109 (1997-03-01), None
Tannin, from WIKIPEDIA http://en.wikipedia.org/wiki/Tannin.
European Search Report dated Feb. 8, 2006, issued in corresponding European Patent Application No. 05-021539.
Office Action dated Oct. 24, 2006 issued in corresponding to Korean Application No. 10-2005-0091525.

Affiliated with

Also associated with

Rating

Resist composition, method of forming resist pattern,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist composition, method of forming resist pattern,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist composition, method of forming resist pattern,... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4047054