Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-04-25
2008-12-23
Tran, Minh-Loan T (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S192000, C257S194000, C257SE29188, C257SE29246, C257S014000
Reexamination Certificate
active
07468524
ABSTRACT:
A nitride-based group III-V compound semiconductor device includes a buffer layer, a first nitride semiconductor layer and a second nitride semiconductor layer successively stacked on a substrate, the first and the second nitride layers having their respective lattice constants a1and a2in the relation a1>a2, an ohmic source electrode and an ohmic drain electrode formed on the second nitride layer, and a piezoelectric effect film formed on at least a partial region between the electrodes, wherein the piezoelectric film exerts compressive stress of an absolute magnitude at least equivalent to that of tensile stress applied to the second nitride layer due to the difference (a1−a2) between the lattice constants of the first and second nitride layers.
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Morrison & Foerster / LLP
Sharp Kabushiki Kaisha
Tran Minh-Loan T
Yang Minchul
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