Photoimageable, thermosettable fluorinated resists

Details Photoimageable, thermosettable fluorinated resists Photoimageable, thermosettable fluorinated resists

2006-03-13

2008-12-02

Kelly, Cynthia H. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S280100, C430S326000, C526S242000

Reexamination Certificate

active

07459262

ABSTRACT:
The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture.

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