Photomask with photoresist test patterns and pattern...

Details Photomask with photoresist test patterns and pattern... Photomask with photoresist test patterns and pattern...

2004-10-26

2008-11-18

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S030000

Reexamination Certificate

active

07452639

ABSTRACT:
A photomask with photoresist test patterns and pattern inspection method using four test patterns on the photomask to perform the exposure on the first photoresist layer in order to adjust the photomask. The present invention prevents misalignment of the first photomask. The information associated with the misalignment is provided to the process engineer based on the location of the test patterns.

REFERENCES:
patent: 5521036 (1996-05-01), Iwamoto et al.
patent: 5798193 (1998-08-01), Pierrat et al.

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