4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle
  6. Analysis and verification

Kuo-Kuei Fu

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Matching method for designing layout patterns on a photomask...

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate

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Phase-shift mask and method for forming a pattern

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Photomask with photoresist test patterns and pattern...

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2256141

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