Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-07-28
1995-09-12
Chaudhuri, Olik
Coating apparatus
Gas or vapor deposition
With treating means
118723E, C23C 1600
Patent
active
054494109
ABSTRACT:
A plasma processing apparatus has a chamber with an open top and a cover plate extending across the open top of the chamber. The cover plate has an opening therethrough. An annular shield of an electrical insulating material is secured to the cover plate around the opening and extends partially across the opening. An aluminum showerhead is within the shield and has holes therethrough through which a gas can pass into the chamber. The showerhead is connected to a source of RF voltage to provide a flow of RF power between the showerhead and an electrode within the chamber. The shield has a plurality of openings therethrough which allows the RF power to flow through the openings from the showerhead to the electrode in the event that the showerhead becomes coated with particles of an insulating material.
REFERENCES:
patent: 4981722 (1991-01-01), Moller et al.
patent: 5275683 (1994-01-01), Arami et al.
patent: 5275977 (1994-01-01), Otsubo et al.
patent: 5310453 (1994-05-01), Fukasawa et al.
patent: 5342471 (1994-08-01), Fukasawa et al.
patent: 5342472 (1994-08-01), Imahasi et al.
Chang Mei
Leung Cissy
Applied Materials Inc.
Chaudhuri Olik
Cohen Donald S.
Dutton Brian K.
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