Patterning process and resist overcoat material

Details Patterning process and resist overcoat material Patterning process and resist overcoat material

2005-04-14

2008-11-25

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C526S072000, C526S286000, C526S287000, C526S319000, C526S320000, C526S321000

Reexamination Certificate

active

07455952

ABSTRACT:
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.

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