Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-16
2008-10-28
Visconti, Geraldina (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S905000, C430S910000
Reexamination Certificate
active
07442490
ABSTRACT:
A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decomposable group; a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a second acid-decomposable group which is different from the first acid-decomposable group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.
REFERENCES:
patent: 2007/0134589 (2007-06-01), Yamamoto et al.
patent: 2007/0134590 (2007-06-01), Fukuhara et al.
patent: 1 515 186 (2005-03-01), None
patent: 1 783 550 (2007-05-01), None
patent: 2004-012545 (2004-01-01), None
patent: 2004/067592 (2004-08-01), None
Iwato Kaoru
Kodama Kunihiko
FUJIFILM Corporation
Sughrue & Mion, PLLC
Visconti Geraldina
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