Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2004-09-24
2008-08-12
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07412671
ABSTRACT:
A first generator section generates a tolerance data corresponding to a target pattern set based on a design data of a semiconductor device. A second generator section generates an image data of a semi-conductor device pattern formed based on the target pattern. An extraction section extracts a contour data of the pattern from the image data supplied from the second generator section. A data synthesizing section is supplied with the tolerance data supplied from the second generator section and the contour data supplied from the extraction section. The data synthesizing section overlaps the tolerance data with the contour data.
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Notification of Reasons for Rejection issued by the Japanese Patent Office on Jan. 9, 2007, for Japanese Patent Application No. 2003-334106, and English-language translation thereof.
Hashimoto Koji
Ikeda Takahiro
Ito Takeshi
Dinh Paul
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Parihar Suchin
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