Method for producing a pellicle for lithography

Details Method for producing a pellicle for lithography Method for producing a pellicle for lithography

2005-08-24

2008-10-07

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S014000, C156S060000

Reexamination Certificate

active

07432023

ABSTRACT:
There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.

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English language translation of Japanese Office Action.

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