Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-06-07
1989-06-06
Martin, Roland E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430285, 430287, 522 93, 522104, 522106, 522108, 522904, 522905, 525 10, 525 33, 525921, G03C 170
Patent
active
048371262
ABSTRACT:
The novel polymers disclosed have the formula: ##STR1## wherein R.sub.1 is R.sub.5 --(z).sub.p ; R.sub.5 is a terminal reactive group --O--; z is --isocyanate--O--; p is zero or 1, however p is zero when m is zero; P .sub.1 is an organic radical; m is zero or 1, however m is zero when n is 1; R.sub.2 is an organic radical; i is an integer from 2 to 6; P.sub.2 is an organic radical; r is zero or 1, however r is zero only when m is zero and n is zero; R.sub.3 is an organic radical; P.sub.4 is the residue from a polyhydroxy compound; n is zero or 1; R.sub.4 is --(v).sub.w --R.sub.6 ; v is --O--isocyanate; w is zero or 1, however, w is zero when m is zero; and R.sub.6 is --O-- terminal reactive group. The polymers are preferably made by first reacting a dianhydride with a polymer having terminal hydroxy groups and then reacting the reaction product with a hydroxy group terminated acrylate or methacrylate or a hydroxy group terminated hydrogen donor containing at least one heterogeneous atom such as O, N, or S. Polymer compositions comprising these polymers have been found to be very useful as photoresists in producing printed circuit boards.
REFERENCES:
patent: Re30102 (1979-09-01), Thomas et al.
patent: 3429852 (1969-02-01), Skoultchi
patent: 3574617 (1971-04-01), Skoultchi
patent: 3631154 (1971-12-01), Kawaguchi et al.
patent: 3647470 (1972-03-01), Tsuda
patent: 3677920 (1972-07-01), Kai et al.
patent: 3704255 (1972-11-01), Braun
patent: 3840390 (1974-10-01), Kozu et al.
patent: 3926638 (1975-12-01), Rosen et al.
patent: 3926639 (1975-12-01), Rosen et al.
patent: 3926640 (1975-12-01), Rosen
patent: 3926641 (1975-12-01), Rosen
patent: 3933746 (1976-01-01), Steele
patent: 4008138 (1977-02-01), Rosen et al.
patent: 4028204 (1977-06-01), Rosen et al.
patent: 4138299 (1979-02-01), Bolgiano
patent: 4158618 (1979-06-01), Pastor
patent: 4158730 (1979-06-01), Baumann et al.
patent: 4283480 (1981-08-01), Davies et al.
patent: 4321319 (1982-03-01), Shoji et al.
patent: 4414277 (1983-11-01), Oxenrider
patent: 4416973 (1983-11-01), Goff
patent: 4421894 (1983-12-01), O'Connor et al.
patent: 4422914 (1983-12-01), Tsao et al.
patent: 4442198 (1984-04-01), Tsao et al.
patent: 4448875 (1984-05-01), Lewis
patent: 4451636 (1984-05-01), Tsao et al.
patent: 4454220 (1984-06-01), Goff
patent: 4481281 (1984-11-01), Tsao et al.
patent: 4483759 (1984-11-01), Szycher et al.
patent: 4515887 (1985-05-01), Davis
Monsanto Industrial Chemicals Co., "Modaflow".
Patent Abstracts of Japan, vol. 3, No. 79 (C-51) (50), 6th Jul. 1979; of JP-A-54 54196 (Teijin K. K.) 28-04-1979.
Baker William L.
Channing Stacey L.
Hamilton Cynthia
Martin Roland E.
W. R. Grace & Co.
LandOfFree
Polymer composition for photoresist application does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymer composition for photoresist application, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymer composition for photoresist application will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-40089